All measurements were performed with the SPECTRO GENESIS ICP optical emission spectrometer (SPECTRO Analytical Instruments, Kleve, Germany) with dual side-on plasma observation. It enables an average factor 2 enhanced sensitivity compared to single radial plasma observation, while eliminating typical axial view interferences. In addition, it offers a high matrix compatibility, linear dynamic range and precision without the need to change the plasma observation mode during analysis. The SPECTRO GENESIS features a Paschen-Runge spectrometer mount, employing the proprietary Optimized Rowland Circle Alignment (ORCA) technique. Consisting of two hollow section cast shells, optimized small volume and 15 linear CMOS detectors, the wavelength range between 175 and 770 nm can be analyzed, allowing complete spectrum capture. Due to the unique reprocessing capabilities of the system, a new measurement is not required even if additional elements or lines are to be determined at a later point in time. (...)